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Basic Information

Gender:Male
E-Mail:
School/Department:凝聚态物理与材料物理研究所
Professional Title:Associate professor
Degree:Doctoral degree

Recommended MA Supervisor

Recommended Ph.D.Supervisor

Paper Publications

Crystal quality evolution of AlN films via high-temperature annealing under ambient N2 conditions

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Impact Factor:0.0
Journal:CrystEngComm
Volume:17
Page Number:7496
Translation or Not:no
Date of Publication:2018-09-14
Date of Publication:2018-09-14

Pre One:Realization of low dislocation density AlN on small-coalescence-area nano-patterned sapphire substrate Next One:High-quality AlN epitaxy on sapphire substrates with sputtered buffer layers

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