杨学林
Gender: Male
Education Level: With Certificate of Graduation for Doctorate Study
Alma Mater: 北京大学
Scientific Research
Research Field
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III-nitride semiconductors:
MOCVD growth of III-nitrides on Si substrate
Impurity and defect in III-nitrides
GaN power devices/RF devices
Paper Publications
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Atomistic Understanding of Dislocation Climb in Nitride Semiconductors: Role of Asymmetric Jogs.Phys. Rev. Lett.,134,056102,2025,null Phys. Rev. Lett., 134, 2025. :056102
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Unambiguous Identification of Carbon Location on N-Site in Semi-insulating GaN.Phys. Rev. Lett.,121,145505,2018,null Phys. Rev. Lett., 121, 2018. :145505
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Vacancy-engineering-induced dislocation inclination in III-nitrides on Si substrates.Phys. Rev. Materials,4,073402,2020,null Phys. Rev. Materials, 4, 2020. :073402
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High-mobility n--GaN drift layer grown on Si substrates.Appl. Phys. Lett.,118,222106,2021,null Appl. Phys. Lett., 118, 2021. :222106
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High mobility GaN drift layer on Si substrates: The role of surface N vacancy on carbon incorporation.Appl. Phys. Lett.,123,022101,2023,null Appl. Phys. Lett., 123, 2023. :022101
Patents
Research Projects
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青年科学基金项目(A类)[原国家杰青项目]:GaN基宽禁带半导体电子材料与器件(2026-2030)
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国家自然科学基金重点项目:Si 衬底上准垂直结构 GaN 功率电子材料及器件(2023-2027) , 结题
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国家自然科学基金优青项目:GaN基宽禁带半导体材料和器件(2020-2022), 国家自然科学基金优青项目 , 在研
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国家重点研发计划课题:大尺寸 Si 衬底上 GaN 及其异质结构的大失配外延和缺陷/应力控制技术研究(2021-2025), 国家重点研发计划子课题 , 在研
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国家自然科学基金面上项目:Si衬底上基于C掺杂的低位错密度GaN基异质结构的应力与杂质行为调控(2015-2019), 国家自然科学基金面上项目 , 结题
