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Degree:Doctoral degree

Status:Employed

School/Department:重离子物理研究所

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A miniaturized ECR plasma flood gun for wafer charge neutralization
Date of Publication:2020-05-20 Hits:

Impact Factor:1.584
DOI number:10.1063/1.5128522
Affiliation of Author(s):北京大学
Journal:Rev. Sci. Instrum
Place of Publication:美国
Key Words:plasma flood gun (PFG)，miniaturized ECR，wafer charge neutralization，no metallic contamination, limitless lifetime
Indexed by:Journal paper
Discipline:Natural Science
First-Level Discipline:Physics
Document Type:J
Volume:91, 033319
Translation or Not:no
Date of Publication:2020-05-20
Included Journals:SCI、EI
Date of Publication:2020-05-20

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Pre One:A global model of 2.45 GHz ECR ion sources for high intensity H+, H2+ and H3+ beams

Next One:Design of a Compact Magnets System for a Hybrid 2.45 GHz Microwave 7Li3+ Ion Source

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