Impact Factor:0.0
DOI number:10.1038/srep21786
Journal:Sci. Rep.
Abstract:Although many devices based on MoS2 have been fabricated, where MoS2-metal contact plays a critical role, the nature of MoS2-metal contact has not been well established yet. We provide the first comparative study of the interfacial properties of a series of monolayer (ML) and bilayer (BL) MoS2-metal contacts (metal = Sc, Ti, Ag, Pt, Ni, and Au) with inclusion of many-electron effects based on a dual interface model. A comparison between the calculated and observed Schottky barrier heights (SBHs) suggests that many-electron effects are strongly depressed and become ineligible when channel MoS2 is doped by electrodes. Ohmic contact is revealed for both ML and BL MoS2-Sc contacts, and Schottky barrier prevails in other contacts, with the SBH decreased by the interlayer coupling. The dual interface model with suppression of the many-electron effects can be expanded to a general device with metal-semiconductor interface.
Indexed by:Journal paper
Discipline:Natural Science
First-Level Discipline:Physics
Volume:6
Page Number:21786
Translation or Not:no
Included Journals:SCI
Date of Publication:2016-03-01